A Secret Weapon For slot gacor
A Secret Weapon For slot gacor
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“Technology” specified in ECCN 4E906 is managed for nationwide safety reasons to all Places as specified pursuant into the nationwide safety controls and license critique policy set forth in § 742.
(3) international individual information, which include all the data that might be offered inside of a deemed export license application, see rules for deemed export license apps beneath the understand and help tab with the BIS Internet site at ;
ECCN 3C908 controls “Fluorides, hydrides, chlorides, of silicon or germanium” containing a specified share of silicon or germanium isotopes. ECCN 3C909 controls “Silicon, silicon oxides, germanium or germanium oxides” made up of a specified percentage of silicon or germanium isotopes. Isotopic enriched Si and Ge are exported with certificates which point out isotopic distribution or mix, no matter their chemical types, by industrial observe. These paperwork would aid examination of no matter whether isotopic purity with the exported product is beneath or over the Manage threshold.
three. `Paraxial configuration' pertains to one or more sensors which can be physically mounted on to or built-in into your “laser”, electron beam, or electric arc consolidation source part.
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2. The resolution with the ADC is the volume of bits with the electronic output of click here the ADC that signifies the calculated analog input. powerful variety of Bits (ENOB) just isn't utilized to find out the resolution of the ADC.
2. `focused chuck overlay' will be the alignment accuracy of a whole new pattern to an existing pattern printed with a wafer by a similar lithographic procedure. `Dedicated chuck overlay' is also called one machine overlay.
technological Notice: for that purposes of 3A001.b.one.d, `dual mode' usually means the “vacuum Digital product” beam present-day could be deliberately altered in between steady-wave and pulsed manner Procedure by utilization of a grid and makes a peak pulse output electric power increased than the continuous-wave output electric power.
h. Multi-layer masks with a period change layer not specified by 3B001.g and created ( print site 72950) to be used by lithography gear having a mild supply wavelength below 245 nm; Observe: 3B001.
1. ECCN 3E905 applies to process “know-how” solely to the “enhancement” or “production” of GAAFET constructions of built-in circuits in a semiconductor wafer creation facility. ECCN 3E905 isn't going to, for instance, Handle an built-in circuit style and design such as the Bodily structure file in “GDSII” format or EDA instruments, or some other technological know-how made use of to generate the physical format file for built-in circuit style. 2. ECCN 3E905 won't implement to vertical GAAFET architectures, e.g.,
Technical Notice: to the purposes of 3A001.g, a `thyristor module' has a number of thyristor devices.
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a.four.b. no less than one particular preclean chamber intended to supply a floor preparation signifies to wash the surface on the wafer; and
You will find a minimal considered export or deemed reexport exclusion from your license needs in paragraph (a)(10)(i) of the portion for the following “software program” or “technological know-how” ECCNs, unless for international folks whose newest citizenship or lasting residency is really a desired destination laid out in place Group D:1 or D:5: 2D910; 2E910;3D001 (“application” for “EUV” masks and reticles in ECCN 3B001. q); 3D901 (for “software program” for quantum merchandise in ECCNs 3A901.b, 3B904 and scanning electron microscopes (SEM) in ECCN 3B903); 3D907 “software program” intended to extract “GDSII” or equivalent information; 3E001 (“technological innovation” for “EUV” masks and reticles in ECCN 3B001.
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